Description
In our range, you can find all the necessary evaporation equipment to help you effectively get the film surface you want. Using conventional current sources: DC, Pulse DC, RF, and ultra-high power HIPIMS, we can offer both reactive and non-reactive films. The sample temperature during the film deposition process can be adjusted from room temperature to 800˚C. The evaporation system can be equipped with different evaporation sources. Evaporation can be fully automated, allowing the films to be reproduced with extreme precision or semi-automated, allowing the desired evaporation processes to be changed during coating.
Chemical vapor deposition (CVP) is a primary thin film deposition process in the semiconductor industry. We offer a choice of highly high vacuum chemical vapor deposition techniques. Plasma-enhanced chemical vapor deposition, combined with vapor using radio- or microwave-generated plasma, is best suited for producing films that are particularly fragile to temperature changes.
All standard systems can be flexibly adapted to the unique needs of your laboratory. In exceptional cases, we can design and manufacture a vacuum system according to an individual order that will be optimally adapted to the specific requirements of your work.
